INTEGRATED FERROELECTRIC MEMS

Researcher: Peter Schiller (Ph.D., Elect. Eng., 1/94)

Project Description: This project addresses the compatible fabrication of integrated MEMS with 1) ferroelectric (FE) thin films, 2) low-stress silicon nitride membrane technology, 3) on-chip CMOS, and 4) high-voltage NMOS. A threshold detection actuator valve has been fabricated to test the concept of smart FE MEMS.

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