105. J.-B. Yoon, B.-K. Kim, C.-H. Han, E. Yoon, and C.-K. Kim, "Surface Micromachined Solenoid On-Si and On-Glass Inductors for RF Applications", IEEE Electron Device Letters, Vol. 20, pp. 487 - 489, 1999.
106. H.-K. Lee, J.-B. Yoon, E. Yoon, S.-B. Ju, Y.-J. Yong, W. Lee, and S.-G. Kim, "A High Fill-Factor Infrared Bolometer Using Micromachined Multi-Level Electrothermal Structures", IEEE Transactions on Electron Devices, Vol. 46, No. 7, pp. 1489-1491, 1999.
107. D. Hah, E. Yoon, S. Hong, "An Optomechanical Pressure Sensor Using Multimode Interference Couplers", Japanese Journal of Applied Physics - Part 1 : Regular Papers and Short Notes, Vol. 38, No. 4B, pp. 2664 - 2668, 1999.
108. J. B. Yoon, C. H. Han, E. Yoon, and C. K. Kim, "Monolithic High-Q Overhang Inductors Fabricated on Silicon and Glass Substrates", IEEE IEDM, Washington DC, USA, pp. 753-756, 1999, 12.
109. S. Y. Myong, H. K. Lee, E. Yoon, and K. S. Lim, "Dependence of the Boron-Doped Microcrystalline SiC:H Film Characteristics on Mercury Bath and Substrate Temperature in Photo-CVD System", International Photovoltaic Science and Eng. Conference, Hokkaido, Japan, pp. 759-796, 1999, 9.
110. J. B. Yoon, C. H. Han, E. Yoon, and C. K. Kim, "High-Performance Three-Dimensional On-Chip Inductors Fabricated by Novel Micromachining Technology for RF MMIC", IEEE MTT-S, Anaheim, USA, pp. 1523-1526, 1999, 6.
111. Sung-Ho Baik, Kyung-Nam Han, Euisik Yoon, "A 230MHz 8 tap Programmable FIR filter Using Redundant Binary Number System", IEEE ISCAS, Vol.3, pp. 415-418, Orlando, USA, 1999, 5.
112. J. B. Yoon, C. H. Han, E. Yoon, and C. K. Kim, "Monolithic Integration of 3D Electroplated MIcrostructures with Unlimited Number of Levels Using Planarization with a Sacrificial Metallic Mold(PSMM)", IEEE MEMS Workshop Proc., Orlando, USA, pp. 624 - 629, 1999, 1.
113. S. Y. Myong, H. K. Lee, E. Yoon, and K. S. Lim, "High Quality Microcrystalline Silicon-Carbide Films Prepared by Photo-CVD Method Using Ethylene Gas as a Carbon Source", MRS Spring Meeting, San Francisco, USA, 1999.
114. E.-C. Park, J.-B. Yoon, and E. Yoon, "Hermetically Sealed Inductor-Capacitor (LC) Resonator for Remote Pressure Monitoring", Japanese Journal of Applied Physics - Part 1 : Regular Papers and Short Notes, Vol. 37, No. 12B, pp. 356 - 360, 1998.
115. J.-B. Yoon, C.-H. Han, E. Yoon, C.-K. Kim, "Monolithic Fabrication of Electroplated Solenoid Inductors Using Three-Dimensional Photolithography of a Thick Photoresist", Japanese Journal of Applied Physics - Part 1 : Regular Papers and Short Notes, Vol. 37,No. 12B, pp. 339 - 343, 1998.
116. J. B. Yoon, B. K. Kim, C. H. Han, E. Yoon, K. Lee, and C. K. Kim, "High-Performance Electroplated Solenoid-Type Integrated Inductor for RF Applications Using Simple 3D Surface Micromachining Technology", IEDM Tech. Dig., San Francisco, USA, pp. 544-547, 1998, 12
117. Hyung-Kew Lee, Jun-Bo Yoon, Euisik Yoon, "A High fill factor IR Bolometer using Multi-level Electrothermal structures", IEDM Tech. Dig., San Francisco, USA, pp. 463 - 466, 1998, 12
118. J. B. Yoon, C. H. Han, E. Yoon, and C. K. Kim, "Novel Two-Step Baking Process for High-Aspect-Ratio Photolithography with Conventional Positive Thick Photoresist", Proc. SPIE, Serial 3512, Santa Clara, USA, pp. 316-325, 1998, 9
119. J. B. Yoon, J. D. Lee, C. H. Han, E. Yoon, and C. K. Kim, "Multilevel microstructure fabrication using single-step 3D photolithography and single-step electroplating" Proc. SPIE. Serial 3512, Santa Clara, USA, pp. 358-366, 1998, 9
120. J. B. Yoon, C. H. Han, E. Yoon, and C. K. Kim, "Novel Monolithic and Multilevel Integration of High-Precision 3D Microfluidic Components", Proc. SPIE, Santa Clara, USA, Serial 3515, pp. 183-191, 1998, 9
121. D. Hah, E. Yoon, and S. Hong, "An Optomechanical Pressure Sensor Using Multi-Mode Interface Couplers", SSDM, Hiroshima, Japan, pp. 388-389, 1998, 9
122. J. B. Yoon, J. D. Lee, C.Han, E. Yoon, C.Kim, "Uniform and Simultaneous Fabrication of High-Precision and High-Density Orifice, Channel, and Reservoirs for Inkjet Printheads", Proc. SPIE, Serial. 3511, Santa Clara, USA, pp. 214-224, 1998, 9
123. J. B. Yoon, C. H. Han, E. Yoon, C. K. Kim, "Novel and High-Yield Fabrication of Electroplated 3D Micro-Coils for MEMS and Microeletronics", Proc. SPIE, Serial 3511, Santa Clara, USA, pp. 233-240, 1998, 9
124. J. B. Yoon, G. Y. Oh, C. H. Han, E. Yoon, and C. K. Kim, "Planarization and Trench Filling on Severe Surface Topography with Thick Photoresis for MEMS", Proc, SPIE, Serial 3511, Santa Clara, USA, pp. 297-306, 1998, 9
125. E. C. Park, J. B. Yoon, E. Yoon,"A Hermetically-Sealed LC Resonator for Remote Pressure Monitoring", MNC, Hiroshima, Japan, pp. 91-92, 1998, 7
126. J. B. Yoon, C. H. Han, E. Yoon, and C. K. Kim, "Novel Fabrication of Electroplated 3D Micro-Coils Using 3D Photolithography of Thick Photoresist", MNC, Hiroshima, Japan, pp. 85-86, 1998, 7
127. E. Yoon and K. D. Wise, "A Wideband Monolithic RMS-DC Converter Using Micromachined Diaphragm Structures", IEEE Transactions on Electron Devices, Vol. 41, pp. 1666-1668, 1994.
128. E. Yoon and K. D. Wise, "An Integrated Mass Flow Sensor with On-Chip Interface Circuitry, IEEE Transactions on Electron Devices", Vol. 39, 1376-1386, 1992.
129. R.W. Allison Jr., E. Yoon, R. Kovacs, C. Skinner, "The Dielectric Discontinuity Microscope- A New Characterization Tool, Microlithography World", Vol. 1, No. 4, 15-20, 1992
130. C. Blair, E. Demirlioglu, E. Yoon, and J. Pierce, "A Titanium Salicide Process Suitable for Deep Submicron CMOS Applications", Proc. Mat. Res. Soc., Serial. 320, USA, pp. 53-58, 1993, 3
131. E. Yoon, M. E. Thomas, and R. P. Kovacs, "Suppression of Grain Growth and Surface Roughness of MOCVD Ta2O5 Films in a Stacked Gate Structure,"Extended Abstract of Electrochem. Soc. Meeting, New Orleans, USA, pp. 253-254, 1993, 3
132. E. Demirliohlu, E. Yoon, J.Pierce, C.Blair, et al., "Minimum-Complexity 0.35um Surface-Channel CMOS Process for Digital Logic and Analog Applications," in Int. Conf. on VLSI and CAD Tech.Dig., Taejon, Korea, pp. 35-38, 1993, 3
133. R. W. Allison Jr., E. Yoon, R. Kovacs, C. Skinner, "The Diclectric Discontinuity Microscope-A New Characterization Tool, "Microlithography World, Vol.1, No.4, pp.15-20, 1992.
134. R. W. Allison Jr., E. Yoon, J. Heard, R. Kovacs, S. Liddicoat, K. Radigan, "Application of a Dielectric Discontinuity Microscope to Process Development at the Fairchild Research Center of National Semiconductor", Proc. SPIE, Serial. 1673, San Jose, USA, pp. 419-431, 1992, 3
135. E. Yoon, R. W. Allison, R. P. Kovacs, and C. Dai, "Phase-Contrast Latent Image Metrology for Microlithography", Proc. SPIE, Serial 1673, San Jose, USA, pp. 580-591, 1992, 3
136. E. Yoon and K. D. Wise, "A Multi-Element Monolithic Mass Flowmeter with On-chip CMOS readout Electronics", IEEE Solid-State Sensor and Actuator Workshop, Hilton Head, USA, pp. 161-164, 1990, 6
137. E. Yoon and K. D. Wise, "A Monolithic RMS-DC Converter Using Planar Diaphragm Structures, International Electron Devices Meeting", Washington DC, USA, pp. 491-494, 1989, 12
138. E. Yoon and K. D. Wise, "A Dielectrically-Supported Multi-Element Mass Flow Sensor, International Electron Devices Meeting", San Francisco , USA, pp. 670-673, 1988, 12